THE CURATORS OF THE UNIVERSITY OF MISSOURI; LEE, Jr., Mark Wayne; SEVRYUGINA, Yulia
Patent: WO2013/82150 A1, 2013 ;
Location in patent: Paragraph 0124 ;
2.合成路线
2094-74-8
90965-06-3
77%
40430-66-8
Wyeth
Patent: US2007/27199 A1, 2007 ;
Location in patent: Page/Page column 23 ;
US 20070027199 A1
3.合成路线
1660-04-4
74%
40430-66-8
Busch, Mark; Schlageter, Martin; Weingand, Daniel; Gehring, Timo
Chemistry - A European Journal, 2009 , vol. 15, # 33 p. 8251 - 8258